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PAMID D620
- Commodity name: PAMID D620
- Details
-
Application system:
Apply to Assembly, Other Adhesives, Selalants
Gunnability, Slump resistance, Temperature resistance ,APEO Free, Heavy Metal Free, Solvent Free, Not intentionally added but not specifically
measured (not part of product specification)
Features:
PAMID D620 is a high performance micronised amide wax rheology
modifier designed for the low temperature manufacture of moisture curing
methoxysilane systems, where processing temperatures typically lie within the
range 60-90℃.PAMID D620 particles are converted to an interacting
network of crystalline fibres. It is this network that gives rise to the shear
thinning rheology. This shear thinning characteristic provides for a low viscosity
at the shear rates associated with application by extrusion, and a very high
viscosity under the low shear rates experienced after application. The net result
is ease of application followed by excellent sag and slump resistance.
Specific performance:
- Easy handling
- Antisettling.
- In-can appearence
- Syneresis resistance
- Viscosity stability
Physical properties:
Nature: Polyamide
Appearance:Off-white micronized powder
Solid Content (%):100
Active Content (%):100
Specific gravity:0.99
Particle size distribution:DV.1 min: 1.8 μm / DV.9 max: 15.0 μm
Bulk density:0.4-0.6
Melting Point(℃):128
Bio content (%):93
Recommended addition level:
1-5% under heat and shear
How to use:
The activation process constitutes the conversion of the CRAYVALLAC* SLX
particles to an interacting network of crystalline fibres. It is this network that
gives rise to the shear thinning rheology. This shear thinning characteristic
provides for a low viscosity at the shear rates associated with application by
extrusion, and a very high viscosity under the low shear rates experienced after
application. The net result is ease of application followed by excellent sag and
slump resistance.Activation at too low a temperature, or for too short a time,
will result in the formation of an inefficient interacting network and
The successful manufacture of methoxysilane based sealants is very dependent
consequently poor sag and slump resistance.
on the careful control of moisture levels throughout manufacture and storage.
For this reason it is normal practice to pre-dry all pigments and extenders prior
to dispersion with the methoxysilane polymer. Alternatively, special grades of
low moisture content ingredients may be used. The use of vacuum processing is
essentially there to prevent the take up of moisture during processing.Due to
the lower processing temperature used, the vacuum processing is not
particularly efficient at removing unwanted water residues introduced with the
raw materials. Therefore a greater emphasis must be put on the pre-drying of
pigments and extenders, or the purchase of special grades of low moisture
content raw materials.
With moisture cured methoxysilane based se alants, we strongly recommend
that all additives be quickly dispersed and not allowed to remain in direct
contact with the resin component.Prolonged contact may sometimes result in
the formation of an insoluble fine skin which later appears as small particles in
the final sealant.
Storage temperature:
It should be stored in the original containers in a dry place at temperatures
between 5℃ (41℉) and 30℃ (86℉). Avoid exposure to direct sunlight or frost.
In these conditions, this product should be used within 48 months from
production..
Precautions:
Avoid direct contact with sunlight.
For additional safety information please see the Safety Data Sheet。
The information described in the above documents is based on data from our experimental center and related literature; we do not assume corresponding legal liability. Our ordinary standards impose only limited obligations. Consistent with local laws and regulations, our company assumes no responsibility for the handling, processing or use of this product.
Key words:
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Application industry
The paint industry
Ink industry
The nanomaterials
Sealing material
Energy industry
Electronic materials
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